VTC-PECVD Laboratory High Vacuum Plasma CVD System

Advanced Laboratory Plasma-Enhanced Chemical Vapor Deposition (PECVD) System

The VTC-PECVD system is engineered for high-performance, plasma-assisted thin-film deposition in a controlled laboratory environment. Utilizing a parallel-plate capacitive configuration, this system ensures uniform coating results for demanding scientific applications.

Key System Features

• Single-tube structure with a manual front door for easy access.
• Durable stainless steel vacuum chamber (Φ300mm×300mm) with visual observation window.
• High vacuum capability, reaching a limit of 8.0×10^-5Pa (with molecular pump).
• Rotatable sample stage for optimized deposition uniformity.
• Precise sample heating up to 500°C with ±1°C accuracy.

Operational Specifications

The system operates at a working vacuum range of 13.3-133Pa, adjustable based on process requirements. It utilizes a 13.56MHz RF power supply with a maximum output of 300W and automatic matching. The electrode spacing between the top sprinkler head and the sample is continuously adjustable online from 15mm to 50mm, complete with a scale index display.

Installation and Requirements

Proper installation requires an ambient temperature of 10°C to 35°C and relative humidity below 75%. The system requires a 220V single-phase power supply (less than 4kW) and a stable water supply (0.2MPa~0.4MPa pressure, 15°C~25°C temperature).

Ordering and Support

For detailed inquiries, configuration options, or to confirm shipping for this specialized equipment, please contact us directly. We offer a one-year guarantee post-shipment and support for various payment methods including Telegraphic Transfer and L/C.